FLOWRATE CONTROL METHODS BASED ON PLC IN WAFER CLEAN TOOL

Flowrate control methods based on PLC in wafer clean tool

Several in common use flowrate control methods in semiconductor wafer clean tool are introduced in this paper, including the flowrate control of process chamber and chemical proportioning, then corresponding control methods are brought Perfume forward according to different applications.The chemical flowrate is directly used as the feedback signal

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Post-Intervention Reconstruction and the Responsibility to Rebuild

This article examines the relationship between the responsibility to rebuild and post-intervention reconstruction.It aims to tumbler determine whether the current interpretation of the responsibility to rebuild is the appropriate framework for attaining the goals of post-intervention reconstruction.The article argues that, despite the urgent need f

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Hydrogeological Characterization of the Gunungsewu Karst Area in the Upper Reach of Gremeng Karst Drainage Basin, Indonesia

The definition of a karst drainage basin in the aquifer of the karst area is an absolute thing to do as a water resource management unit.This research aimed to characterize the hydrogeology of the Gunungsewu Karst Area Perfume in the upper reach of the Gremeng Karst Drainage Basin.For this purpose, it was divided into three stages, namely geologica

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